Metal Lift Off Equipment

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Advanced Metal Lift Off equipment combining solvent soak with single wafer spin processing.
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Advanced Metal Lift Off equipment combines immersion batch processing with single wafer spin technology. Single wafer transfer with specialized software is used to assure that each and every wafer sees the same amount of submersion dip time. A constant drip handling environment keeps the wafers wet at all times.

The solvent bath is equipped with megasonic and agitation. The bath is filtered, recirculated, and temperature controlled. Multiple filtration levels keep the chemical clean.

The spin modules have simultaneous front and backside processing. The spin modules enable several programmable processes including moving arm pressure spray, final clean, rinse, and blow dry. The cup segments processing to enable separate chemical drains and water drain. Multiple filters enable easy access to captured materials.

Systems are sold with optional chemical supply cabinet and waste management system designed for safety, convenience, and servicability.

Manufactured by GZ-Inc, these quality Korean made tools are supported by field service infrastructure throughout the world.
Metal Lift-Off
Equipment
Single Wafer Spin
Processors